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KD9363S-250kg寰瀷鎷夊鍔涘偝鎰熷櫒ME-systeme
KD9363S-250kg寰瀷鎷夊鍔涘偝鎰熷櫒ME-systeme
鐢�(ch菐n)鍝佸児(ji脿)鏍硷細锟�1
涓婃灦鏃ユ湡锛�2023-07-14 17:04:09
鐢�(ch菐n)鍦帮細寰峰湅
鐧�(f膩)璨ㄥ湴锛�寰峰湅
渚涙噳(y墨ng)鏁�(sh霉)閲忥細涓嶉檺
鏈€灏戣捣瑷傦細1鍊�(g猫)
鐎忚閲忥細356
璩囨枡涓嬭級锛�鏆劇璩囨枡涓嬭級
鍏朵粬涓嬭級锛�鏆劇鐩搁棞(gu膩n)涓嬭級
瑭崇窗(x矛)瑾槑

    KD9363S-250kg寰瀷鎷夊鍔涘偝鎰熷櫒ME-systeme          KD9363S-250kg寰瀷鎷夊鍔涘偝鎰熷櫒ME-systeme            KD9363S-250kg寰瀷鎷夊鍔涘偝鎰熷櫒ME-systeme

    寰峰湅ME-systeme绋遍噸鍌虫劅鍣�

    娣卞湷璜稿绉戞妧鏈夐檺鍏徃

    鑱�(li谩n)绯讳汉锛氱洓缍�(j墨ng)鐞�    135,5478,7918


    KM40e

    type: load cell;
    nominal force: 100N;
    accuracy class: 0.5 %;
    dimensions: ? 40mm x 25mm;
    force transmission: load button R50, ? 11 mm;
    connection: 3 m Unitronic FD CP Plus / 3x2x0,14;
    integrated electronics GSV 13i;
    analog output 0.05 ... 10V, 1000S/s;
    autoscale function for b sensitivity 0.1 ... 3.0 mV/V;
    autozero function for zeroing to 0.1V;
    material: stainless steel;
    Option HA (High Accuracy)
    kD鍔涘偝鎰熷櫒瑷�(sh猫)瑷�(j矛)鐐哄綆鏇叉銆傚畠鍊戞槸鍠柟闈㈠浐瀹氱殑銆傚湪姊佺殑鑷敱绔紝寮曞叆鍔�銆傚姏鐨勬脯閲忛噰鐢ㄩ洐鍏夋潫娓噺鍘熺悊銆�
    鍥犳锛岄€欎簺鍔涘偝鎰熷櫒鍦ㄥ緢澶х▼搴︿笂灏�(du矛)绉诲嫊(d貌ng)闆绘簮杓稿叆涓嶆晱鎰�銆�
    KD39-5N銆並D39-10N銆並D39-20N銆並D45-2N銆並D45-5N銆並D45-10N銆並D45-20N銆並D45-10N/VA
    KD45-20N/VA銆並D45-50N/VA銆並D45-10N/VA/HT銆並D45-20N/VA/HT銆並D45-50N/VA/HT
    KD60-5N銆並D60-10N銆並D60-20N銆並D60-50N銆並D60-100N銆並D60-10N/VA銆並D60-20N/VA
    KD60-50N/VA銆並D60-100N/VA銆並D60-200N/VA銆並D60-1kN/VA銆並D68-5N,KD68-10N,KD68-20N,
    KD68-50N,KD68-100N,KD68-200N,KD68-300N,KD68-500N,KD68-1KN,
    鎳歌噦姊�
    KD78-500mN銆並D120-100N
    KD120-200N銆並D120-500N銆並D120-1kN銆並D140-50N銆並D140-100N銆並D140-200N銆並D140-500N
    KD191-50kg銆並D191-100kg銆並D191-200kg銆並D191-500kg銆並D191-1000kg锛孠D33-50MN

    HA - advantages:
    Device Wavelength Range Fill Factor
    GAEA-2-VIS-036 420 鈥� 650 nm 90 %
    GAEA-2-NIR-069 650 鈥� 1100 nm 90 %
    GAEA-2-TELCO-033 1400 鈥� 1700 nm 90 %
    GAEA-2 4K LCOS SLM Kit
    GAEA-2 LCOS-SLM
    PLUTO-2 LCOS绌洪枔鍏夎(di脿o)鍒跺櫒鍍呯浉浣嶏紙鍙嶅皠锛�
    PLUTO-2-UV-099 350 鈥� 420 nm 90 % 2.8 Pi @ 355 nm
    PLUTO-2-VIS-014 420 鈥� 650 nm 65 % 3.9 Pi @ 530
    PLUTO-2-VIS-016 420 鈥� 650 nm 67 % 6.7 Pi @ 530 nm
    PLUTO-2-VIS-096 450 鈥� 650 nm 95-98 % 3.1 Pi @ 530 nm
    PLUTO-2-NIR-011 420 鈥� 1100 nm 65-75 % 4.5 Pi @ 530 nm
    PLUTO-2-NIR-015 650 鈥� 1100 nm 65-73 % 4.4 Pi @ 850 nm
    PLUTO-2-NIR-080 730 鈥� 950 nm 95 % 4.8 Pi @ 800 nm
    PLUTO-2-NIR-149 1000 鈥� 1100 nm 93 % 2.5 Pi @ 1064 nm
    PLUTO-2-NIRO-023 1000 鈥� 1400 nm 74 % 4.1 Pi @ 1400 nm
    PLUTO-2-TELCO-013 1400 鈥� 1700 nm 80 % 3.5 Pi @ 1550 nm
    PLUTO-2-TELCO-059 1500 鈥� 1600 nm 90 % 2.9 Pi @ 1550 nm
    PLUTO-2 Spatial Light Modulator Kit
    LETO绱旂浉浣嶇┖闁撳厜瑾�(di脿o)鍒跺櫒锛堝弽灏勫紡锛�
    LETO-VIS-009 420 鈥� 800 nm ~75 % 3.7 Pi @ 530 nm
    LETO-VIS-017 420 鈥� 650 nm ~75 % min 2 Pi @ visible range
    LETO-NIR-081 650 鈥� 1100 nm 62-70% 4.4 Pi @ 650 nm
    LC 2012绌洪枔鍏夎(di脿o)鍒跺櫒锛堥€忓皠寮忥級
    LC 2012
    OPTIXPLORER鈥撳厜瀛�(xu茅)鏁欒偛濂椾欢
    SLM杌熶欢
    SLM鐔辩鐞嗙郴绲�(t菕ng)
    TMS 001锛氬付棰�(f膿ng)鍐锋暎鐔卞櫒鐨勭啽绠$悊绯荤当(t菕ng)
    TMS 002锛氬付姘村喎鏁g啽鍣ㄧ殑鐔辩鐞嗙郴绲�(t菕ng)
    鍋滅敘(ch菐n)瑷�(sh猫)鍌�
    LC-R 720锛孡C-R 1080锛孡C 2002锛孡C-R 2500锛孒EO 1080P锛孡C-R 768锛孡C-R 3000


    high precision, the accuracy class is increased up to approximaby 0.1%;
    selection of the sensors;
    use of special calibration accessories;

    repeated calibration tests;

    S鍨嬪姛鐜囧偝鎰熷櫒KDS鐨勫叐鍋�(c猫)閮介厤鏈夌敤浜庤几鍏ュ姛鐜囩殑鍏�(n猫i)铻虹磱銆傚洜姝わ紝瀹冨€戞棦閬╃敤浜庢脯閲忕壗寮曞姏锛屼篃閬╃敤浜庢脯閲�
    澹撶府鍔涖€�
    S褰㈠姏鍌虫劅鍣ㄤ娇鐢ㄩ洐褰庢洸妗匡紙鐢ㄤ簬杓冨皬鐨勬脯閲忚寖鍦嶏級鎴栧壀鍒囨】锛堢敤浜庤純澶х殑娓噺鑼冨湇锛変綔鐐鸿畩褰㈤珨銆�
    KD24s-2N/KL銆並D24s-2N銆並D24s-10N銆並D24s-20N銆並D24s-50N銆並D24s-100N銆並D24s-200N
    KD34s-0.25N銆並D34s-0.5N銆並D34s-1N銆並D34s-2N銆並D34s-5N銆並D34s-10N銆並D40s-2N
    KD40s-5N銆並D40s-10N銆並D40s-20N銆並D40s-50N銆並D40s-100N銆並D40s-200N銆並D40s-500N銆�
    KD40s-1kN銆並D40s-2kN銆�


    Kr绯诲垪鍙楀姏鍌虫劅鍣ㄧ殑鐗归粸(di菐n)鏄祼(ji茅)妲�(g貌u)骞虫暣锛岀簿搴﹂潪甯搁珮.閲嶅鍠厓KR80绲�(ji茅)鍚堝柈鐗囨(j墨)锛岀敤浜庨珮绮惧害绋遍噸瀹瑰櫒.
    閫氶亷浣跨敤璨�(f霉)杓夋寜閳�锛岄€欑ó璨�(f霉)杓夊柈鍏冧篃鍙敤浜庨珮绮惧害鐨勫姏娓噺銆�
    KR20-5kN/M5銆並R20-6kN/M6銆並R20-20kN/M6銆並R20-20kN/M8銆並R20-40kN/M8銆並R20-50kN
    KR70-20N銆並R70-50N銆並R70-100N銆並L20銆並L500-100kN銆並L500-200kN銆並L500-500kN銆�

    KS绯诲垪鐨勫彈鍔涙壙杓夊櫒锛屼互娓畾涓€鑷�(t谩i)绔欒桓鎵跨殑鍔�銆傚姏娓噺鏄湪閫欏€�(g猫)鍔涢噰闆嗗櫒鍦ㄥ叐鍊�(g猫)鏀壙涔嬮枔閫�(j矛n)琛岀殑銆�
    KS180-15kN銆並S180-20kN銆並S180-30kN銆並S420-10kN銆並S420-20kN銆並S420-50kN銆並S575-50kN
    KS575-100kN

    careful configuration and calibration process;

    better adjustment inside the sensor and on the testing machine

    寰’绀烘妧琛�(sh霉)
    HED 6001鍠壊LCOS寰’绀哄櫒
    HED 2200褰╄壊LCOS寰’绀哄櫒
    HED 5216褰╄壊LCOS寰’绀哄櫒
    HED 7200褰╄壊LCOS寰’绀哄櫒
    HED 5201鍠壊LCOS寰’绀哄櫒
    HED 1316褰╄壊LCOS寰’绀哄櫒
    HED 1016褰╄壊娑叉櫠椤ず鍣�
    绌哄績鍏夋潫鐢�(ch菐n)鐢熷櫒HES6001-VIS
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    鎸箙鍨嬬┖闁撳厜瑾�(di脿o)鍒跺櫒HES 6001-VIS
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    绱旀尟骞呭瀷绌洪枔鍏夎(di脿o)鍒跺櫒HES6001
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    绌洪枔鍏夎(di脿o)鍒跺櫒HES6010-NIR姝g⒑鍨嬭櫉(h脿o)GAEA-NIR-069
    绌洪枔鍏夎(di脿o)鍒跺櫒 瑾�(di脿o)鍒堕鍨嬶細绱旂浉浣嶅瀷 娑叉櫠椤炲瀷锛氬弽灏勫紡 鍏夎瓬鑼冨湇锛�650nm-1100nm 鍍忕礌锛�3840*2160 鍍忓厓锛�3.74um 鐩镐綅鑼冨湇锛�2蟺@650nm-1064nm 濉厖鍥犲瓙锛�93% 闊挎噳(y墨ng)鏅�(sh铆)闁擄細90ms 骞€闋伙細60HZ 鏁�(sh霉)鎿�(j霉)鎺ュ彛锛欻DMI
    娑叉櫠绌洪枔鍏夌浉浣嶈(di脿o)鍒跺櫒PLUTO-2.1NIR-135 绱旂浉浣嶅瀷锛� 鍙嶅皠寮�锛� 8 浣�256 闅庯紝 1920脳1080锛� 8.0 渭m鍍忕礌锛屽昂瀵� 15.36 x 8.64mm,鍏夎瓬鑼冨湇 420-1100 nm锛岀浉浣嶈钃嬭寖鍦� 5.0蟺@530nm 锛�2.5蟺 @800nm锛� 2.0蟺@1000nm锛岀┅(w臎n)瀹氭€� 2.3%(0.007蟺)@633nm锛屽~鍏呭洜瀛� 93%锛岄熆鎳�(y墨ng)鏅�(sh铆)闁� 60Hz ~40ms锛屽弽灏勭巼 79%锛屾渶澶у厜寮�(qi谩ng) 2W/cm2
    楂樺垎杈ㄧ┖闁撳厜瑾�(di脿o)鍒跺櫒PLUTO-2.1-NIR
    绌洪枔鍏夎(di脿o)鍒跺櫒PLUTO-2.1-UV-099

    瑭插姏閫氶亷鎷変几姊濇脯閲�锛屾媺浼告鏂藉姞鍦ㄨ啘鐨勫簳闈紝鑶滅殑娌栨搳鍐�銆傚姛鐜囨脯閲忕綈鐨勫収(n猫i)閮ㄥ绌嶇敤閼勯€犳ü鑴傜亴婊匡紝
    骞剁敤閲戝爆钃嬪皝闁�銆傚洜姝わ紝鈥滃姛鐜囨脯閲忕鈥濈殑瑷�(sh猫)瑷�(j矛)鐗瑰垾鍫�(ji膩n)鍥哄拰渚垮疁銆傝純澶у瀷铏�(h脿o)鐨�40km銆�90km銆�115km
    绮惧害绛夌礆(j铆)閬�(d谩)鍒�0.5%锛岀敋鑷抽仈(d谩)鍒�0.2%銆�
    KM10-25N銆並M10-50N銆並M10-100N銆並M10-200N銆並M10-500N銆並M12-5kN銆並M25-100N
    KM25-1kN銆並M25-500N銆並M25-200N銆並M26-100N銆並M26-200N銆並M26-500N銆並M26-1kn
    KM26-2kn銆並M26-5kn銆並M26-10kn銆並M38-1kn銆並M38-2kn銆並M38-5kn銆並M38-10銆乲n115
    KM90-20kN銆並M90-50kN銆�

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